WO2009094276A3 - Vertical outgassing channels - Google Patents

Vertical outgassing channels Download PDF

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Publication number
WO2009094276A3
WO2009094276A3 PCT/US2009/030997 US2009030997W WO2009094276A3 WO 2009094276 A3 WO2009094276 A3 WO 2009094276A3 US 2009030997 W US2009030997 W US 2009030997W WO 2009094276 A3 WO2009094276 A3 WO 2009094276A3
Authority
WO
WIPO (PCT)
Prior art keywords
channels
insulator
box
bonding surface
buried oxide
Prior art date
Application number
PCT/US2009/030997
Other languages
French (fr)
Other versions
WO2009094276A2 (en
Inventor
Di Liang
Original Assignee
The Regents Of The University Of California
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by The Regents Of The University Of California filed Critical The Regents Of The University Of California
Priority to CN200980102158.7A priority Critical patent/CN101999165B/en
Priority to EP09703836.8A priority patent/EP2238614B1/en
Publication of WO2009094276A2 publication Critical patent/WO2009094276A2/en
Publication of WO2009094276A3 publication Critical patent/WO2009094276A3/en

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L29/00—Semiconductor devices adapted for rectifying, amplifying, oscillating or switching, or capacitors or resistors with at least one potential-jump barrier or surface barrier, e.g. PN junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof  ; Multistep manufacturing processes therefor
    • H01L29/02—Semiconductor bodies ; Multistep manufacturing processes therefor
    • H01L29/06—Semiconductor bodies ; Multistep manufacturing processes therefor characterised by their shape; characterised by the shapes, relative sizes, or dispositions of the semiconductor regions ; characterised by the concentration or distribution of impurities within semiconductor regions
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having at least one potential-jump barrier or surface barrier, e.g. PN junction, depletion layer or carrier concentration layer
    • H01L21/50—Assembly of semiconductor devices using processes or apparatus not provided for in a single one of the subgroups H01L21/06 - H01L21/326, e.g. sealing of a cap to a base of a container
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having at least one potential-jump barrier or surface barrier, e.g. PN junction, depletion layer or carrier concentration layer
    • H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having at least one potential-jump barrier or surface barrier, e.g. PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic System or AIIIBV compounds with or without impurities, e.g. doping materials
    • H01L21/20—Deposition of semiconductor materials on a substrate, e.g. epitaxial growth solid phase epitaxy
    • H01L21/2003—Deposition of semiconductor materials on a substrate, e.g. epitaxial growth solid phase epitaxy characterised by the substrate
    • H01L21/2007—Bonding of semiconductor wafers to insulating substrates or to semiconducting substrates using an intermediate insulating layer
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having at least one potential-jump barrier or surface barrier, e.g. PN junction, depletion layer or carrier concentration layer
    • H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having at least one potential-jump barrier or surface barrier, e.g. PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic System or AIIIBV compounds with or without impurities, e.g. doping materials
    • H01L21/30—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26
    • H01L21/324—Thermal treatment for modifying the properties of semiconductor bodies, e.g. annealing, sintering
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/70—Manufacture or treatment of devices consisting of a plurality of solid state components formed in or on a common substrate or of parts thereof; Manufacture of integrated circuit devices or of parts thereof
    • H01L21/71—Manufacture of specific parts of devices defined in group H01L21/70
    • H01L21/76—Making of isolation regions between components
    • H01L21/762—Dielectric regions, e.g. EPIC dielectric isolation, LOCOS; Trench refilling techniques, SOI technology, use of channel stoppers
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/70—Manufacture or treatment of devices consisting of a plurality of solid state components formed in or on a common substrate or of parts thereof; Manufacture of integrated circuit devices or of parts thereof
    • H01L21/71—Manufacture of specific parts of devices defined in group H01L21/70
    • H01L21/76—Making of isolation regions between components
    • H01L21/762—Dielectric regions, e.g. EPIC dielectric isolation, LOCOS; Trench refilling techniques, SOI technology, use of channel stoppers
    • H01L21/7624—Dielectric regions, e.g. EPIC dielectric isolation, LOCOS; Trench refilling techniques, SOI technology, use of channel stoppers using semiconductor on insulator [SOI] technology
    • H01L21/76251—Dielectric regions, e.g. EPIC dielectric isolation, LOCOS; Trench refilling techniques, SOI technology, use of channel stoppers using semiconductor on insulator [SOI] technology using bonding techniques

Abstract

InP epitaxial material is directly bonded onto a Silicon-On-Insulator (SOI) wafer having Vertical Outgassing Channels (VOCs) between the bonding surface and the insulator (buried oxide, or BOX) layer. H2O and other molecules near the bonding surface migrate to the closest VOC and are quenched in the buried oxide (BOX) layer quickly by combining with bridging oxygen ions and forming pairs of stable nonbridging hydroxyl groups (Si-OH). Various sizes and spacings of channels are envisioned for various devices.
PCT/US2009/030997 2008-01-14 2009-01-14 Vertical outgassing channels WO2009094276A2 (en)

Priority Applications (2)

Application Number Priority Date Filing Date Title
CN200980102158.7A CN101999165B (en) 2008-01-14 2009-01-14 Vertical outgassing channels
EP09703836.8A EP2238614B1 (en) 2008-01-14 2009-01-14 Vertical outgassing channels

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US2092008P 2008-01-14 2008-01-14
US61/020,920 2008-01-14

Publications (2)

Publication Number Publication Date
WO2009094276A2 WO2009094276A2 (en) 2009-07-30
WO2009094276A3 true WO2009094276A3 (en) 2009-09-17

Family

ID=40901599

Family Applications (1)

Application Number Title Priority Date Filing Date
PCT/US2009/030997 WO2009094276A2 (en) 2008-01-14 2009-01-14 Vertical outgassing channels

Country Status (4)

Country Link
US (3) US8129257B2 (en)
EP (1) EP2238614B1 (en)
CN (2) CN101999165B (en)
WO (1) WO2009094276A2 (en)

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US8155666B2 (en) 2008-06-16 2012-04-10 Skyhook Wireless, Inc. Methods and systems for determining location using a cellular and WLAN positioning system by selecting the best cellular positioning system solution
US8941442B2 (en) 2010-02-04 2015-01-27 Honeywell International Inc. Fabrication techniques to enhance pressure uniformity in anodically bonded vapor cells
US8299860B2 (en) 2010-02-04 2012-10-30 Honeywell International Inc. Fabrication techniques to enhance pressure uniformity in anodically bonded vapor cells
US8729673B1 (en) * 2011-09-21 2014-05-20 Sandia Corporation Structured wafer for device processing
TW201401547A (en) * 2012-06-19 2014-01-01 Chi Mei Lighting Tech Corp Fabricating method for light emitting diode
CN105023877B (en) 2014-04-28 2019-12-24 联华电子股份有限公司 Semiconductor chip, package structure and manufacturing method thereof
WO2016018288A1 (en) 2014-07-30 2016-02-04 Hewlett-Packard Development Company, L.P. Hybrid multilayer device
WO2016018285A1 (en) 2014-07-30 2016-02-04 Hewlett-Packard Development Company, L.P. Optical waveguide resonators
US9455179B1 (en) 2015-07-09 2016-09-27 International Business Machines Corporation Methods to reduce debonding forces on flexible semiconductor films disposed on vapor-releasing adhesives
US10658177B2 (en) 2015-09-03 2020-05-19 Hewlett Packard Enterprise Development Lp Defect-free heterogeneous substrates
WO2017123245A1 (en) 2016-01-15 2017-07-20 Hewlett Packard Enterprise Development Lp Multilayer device
US11088244B2 (en) 2016-03-30 2021-08-10 Hewlett Packard Enterprise Development Lp Devices having substrates with selective airgap regions
US10079471B2 (en) 2016-07-08 2018-09-18 Hewlett Packard Enterprise Development Lp Bonding interface layer
US10193634B2 (en) 2016-09-19 2019-01-29 Hewlett Packard Enterprise Development Lp Optical driver circuits
US10381801B1 (en) 2018-04-26 2019-08-13 Hewlett Packard Enterprise Development Lp Device including structure over airgap
US10541214B2 (en) * 2018-04-27 2020-01-21 Juniper Networks, Inc. Enhanced bonding between III-V material and oxide material
US20200075533A1 (en) 2018-08-29 2020-03-05 Invensas Bonding Technologies, Inc. Bond enhancement in microelectronics by trapping contaminants and arresting cracks during direct-bonding processes

Citations (5)

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US6455398B1 (en) * 1999-07-16 2002-09-24 Massachusetts Institute Of Technology Silicon on III-V semiconductor bonding for monolithic optoelectronic integration
US6492195B2 (en) * 1999-12-24 2002-12-10 Hitachi, Ltd. Method of thinning a semiconductor substrate using a perforated support substrate
US7148122B2 (en) * 2004-08-24 2006-12-12 Intel Corporation Bonding of substrates
US20060284247A1 (en) * 2005-06-17 2006-12-21 Godfrey Augustine Novel method for integrating silicon CMOS and AlGaN/GaN wideband amplifiers on engineered substrates
US20070155056A1 (en) * 2005-12-30 2007-07-05 Samsung Electronics Co., Ltd. Silicon direct bonding method

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US6468823B1 (en) * 1999-09-30 2002-10-22 California Institute Of Technology Fabrication of optical devices based on two dimensional photonic crystal structures and apparatus made thereby
US6933586B2 (en) * 2001-12-13 2005-08-23 International Business Machines Corporation Porous low-k dielectric interconnects with improved adhesion produced by partial burnout of surface porogens
US7206488B1 (en) * 2004-09-22 2007-04-17 The Board Of Trustees Of The Leland Stanford Junior University Coupled photonic crystal resonator array arrangements and applications

Patent Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6455398B1 (en) * 1999-07-16 2002-09-24 Massachusetts Institute Of Technology Silicon on III-V semiconductor bonding for monolithic optoelectronic integration
US6492195B2 (en) * 1999-12-24 2002-12-10 Hitachi, Ltd. Method of thinning a semiconductor substrate using a perforated support substrate
US7148122B2 (en) * 2004-08-24 2006-12-12 Intel Corporation Bonding of substrates
US20060284247A1 (en) * 2005-06-17 2006-12-21 Godfrey Augustine Novel method for integrating silicon CMOS and AlGaN/GaN wideband amplifiers on engineered substrates
US20070155056A1 (en) * 2005-12-30 2007-07-05 Samsung Electronics Co., Ltd. Silicon direct bonding method

Non-Patent Citations (3)

* Cited by examiner, † Cited by third party
Title
BOWERS ET AL.: "A technology for integrating active photonic devices on SOI waters", PROCEEDINGS OF 2006 INTERNATIONAL CONFERENCE ON INDIUM PHOSPHIDE AND RELATED MATERIALS, 5 June 2006 (2006-06-05), pages 218 - 221, XP008139215 *
FANG ET AL.: "Electrically pumped hybrid AlGalnAs-silicon evanescenet laser", OPTICS EXPRESS, vol. 14, no. 20, 2 October 2006 (2006-10-02), pages 9203 - 9210, XP002457693 *
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Also Published As

Publication number Publication date
EP2238614B1 (en) 2020-03-11
CN105161429A (en) 2015-12-16
WO2009094276A2 (en) 2009-07-30
US20120119258A1 (en) 2012-05-17
EP2238614A4 (en) 2015-04-29
US9263513B2 (en) 2016-02-16
US20090194787A1 (en) 2009-08-06
CN101999165A (en) 2011-03-30
CN101999165B (en) 2015-09-16
US20140159210A1 (en) 2014-06-12
US8664083B2 (en) 2014-03-04
US8129257B2 (en) 2012-03-06
EP2238614A2 (en) 2010-10-13
CN105161429B (en) 2018-06-05

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